Xytel India provides sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter. An array of magnetron sputtering sources, using RF, DC, or pulsed DC power, is operated singly or in co-deposition mode to produce a wide variety of film compositions. Substrate stages for wafers up to 300 mm in diameter are available with heating to 850°C and RF bias.

The system is at the forefront of Magnetron Sputtering technology, showcasing unparalleled flexibility and efficiency tailored for the advanced needs of small to medium-sized R&D laboratories. This system is an essential tool for developing thin film coatings and optical coatings through sputter coating, including applications in 3D batteries and anti-reflecting surfaces. Capable of accommodating cathodes, the sputtering system excels in various sputtering tasks, providing precision and versatility in magnetron sputtering.